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a-Si:H crystallization from isothermal annealing and its dependence on the substrate used
(2012-11-27)
We present hydrogenated amorphous silicon (a-Si:H) films which were deposited on two different substrates
(glass and mono-crystalline silicon) after an isothermal annealing treatment at 250 ◦C for up to
14 h. The annealed ...
a-Si:H crystallization from isothermal annealing and its dependence on the substrate used
(2012-11-27)
We present hydrogenated amorphous silicon ( a-Si:H) films which were deposited on two different sub
strates (glass and mono-crystalline silicon) after an isothermal annealing treatment at 250"( for up to
14 h.The ...
Influence of microstructure and hydrogen concentration on amorphous silicon crystallization
(Elsevier Science Sa, 2010-07)
Hydrogenated amorphous silicon samples were deposited on glass substrates at different temperatures by high 20 frequency plasma-enhanced chemical vapor deposition. In this way, samples with different hydrogen 21 concentrations ...
Characterization of a hydrogenated amorphous silicon microbolometer array
(2012-12-17)
We present the characterization of a boron doped hydrogenated amorphous silicon (a-Si:H) thermosensor bolometer
array for far infrared detection. The array was fabricated over a silicon wafer on a 0.4 μm silicon-nitride ...
Structural characterization of microcrystalline-amorphous hydrogenated silicon samples prepared by PECVD method
(2012-12-17)
Microcrystalline-amorphous doped hydrogenated silicon (tc a-Si:H) samples were prepared by using plasma
enhanced chemical vapor deposition (PECVD) method. The samples were deposited on coming substrates at 270 °C and
then ...
a-Si:H crystallization from isothermal annealing and its dependence on the substrate used
(2012-11-27)
We present hydrogenated amorphous silicon ( a-Si:H) films which were deposited on two different sub
strates (glass and mono-crystalline silicon) after an isothermal annealing treatment at 250"( for up to
14 h.The ...
a-Si:H crystallization from isothermal annealing and its dependence on the substrate used
(2012-12-17)
We present hydrogenated amorphous silicon (a-Si:H) films which were deposited on two different substrates
(glass and mono-crystalline silicon) after an isothermal annealing treatment at 250 ◦C for up to
14 h. The annealed ...
Hydrogen role on the properties of amorphous silicon nitride
(1999-08-15)
We have developed an interatomic potential to investigate structural properties of hydrogenated amorphous silicon nitride. The interatomic potential used the Tersoff functional form to describe the Si–Si, Si–N, Si–H, N–H, ...