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Efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs
(A V S Amer Inst PhysicsMelvilleEUA, 2006)
Corrosão por plasma para tecnologias CMOS e microssistemas
([s.n.], 2003)
Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
(Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales, 2012)
In the present work titanium dioxide (TiO2) thin films were grown by d.c. reactive magnetron sputtering process, systematically varying the Ar/O2 ratio in the gas mixture, in order to study the influence of the oxygen ...