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Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition
(ELSEVIER SCIENCE SA, 2010)
Thin silicon nitride films were prepared at 350 degrees C by inductively coupled plasma chemical vapor deposition on Si(100) substrates under different NH(3)/SiH(4) or N(2)/SiH(4) gas mixture. The chemical composition and ...
Multiphysics simulation of laser-material interaction during laser powder depositon
(SPRINGER LONDON LTD, 2012)
This work reports a theoretical and numerical study of the parameters related to the process of laser powder deposition through a lateral nozzle. For this purpose, a 3D quasi-stationary finite element model was developed ...
Microstructure and composition design of magnetic Ni-Mn-Sn Co-sputter deposited films
(SCIENCEDOMAIN international, 2015)
Electrochemical characterization of samples of commercial steel treated with acetylene plasma
(Natl Inst Science Communication-niscair, 2020-02-01)
Cutting tools have been employed in wood processing must be corrosion and wear resistant due to the acidic composition of wood and the wear generated during cutting, which lead to the deterioration of steel saws. Hydrogenated ...
Electrochemical characterization of samples of commercial steel treated with acetylene plasma
(2020-02-01)
Cutting tools have been employed in wood processing must be corrosion and wear resistant due to the acidic composition of wood and the wear generated during cutting, which lead to the deterioration of steel saws. Hydrogenated ...
Reaction of Si (100) with silane-methane low-power plasma: SiC buffer-layer formation
(Amer Inst PhysicsWoodburyEUA, 1999)
Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications
(Elsevier Science SaLausanneSuíça, 2008)
Influence of the microstructure on the electrochemical performance of thin film WO3 cathode
(Elsevier Science BvAmsterdamHolanda, 2006)