Nitrogen-doped TiO2 films were grown on borosilicate glass substrates at 400 ??C by the metallorganic chemical vapor deposition (MOCVD) for removing dye from water under visible light. The effect of N-doping on the structural, surface, and photocatalytic properties of films was evaluated. X-ray photoelectron spectroscopy (XPS) analyses revealed that 1.56 and 2.44 at% of nitrogen were incorporated into the films by varying the NH3 flux during the growth. Methyl orange dye degradation experiments showed that the N-doped films presented photoactivity under visible light. The film containing 2.44 at% of nitrogen exhibited the best photocatalytic behavior, with 55% of efficiency. Recyclability tests under visible light showed that the film efficiency dropped gradually after each test. N-TiO2 films grown by MOCVD have the potential to be used in environmental applications by removing pollutants using a green method under sunlight or even under internal illumination, although its reuse is limited.Conselho Nacional de Desenvolvimento Cient??fico e Tecnol??gico (CNPq)Funda????o de Amparo ?? Pesquisa do Estado de S??o Paulo (FAPESP)CNPq: 168935/2018-0FAPESP: 05/55861-4