Artigo de peri??dico
Production and characterization of carbon thin films by the magnetron sputtering technique
Registro en:
1662-9752
881
10.4028/www.scientific.net/MSF.881.471
Autor
SILVA, D.L.C.
KASSAB, L.R.P.
MARTINELLI, J.R.
SANTOS, A.D.
PILLIS, M.F.
Resumen
Carbon thin films were produced by the magnetron sputtering technique. The deposition
of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001)
sapphire substrates. The samples were thermally treated under vacuum conditions and characterized
by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The
XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good
degree of crystallinity of the carbon film.