Analysis of the mean crystallite size and microstress in titanium silicide thin films

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Registro en:

http://repositorio.ipen.br/handle/123456789/8798

38

https://repositorioslatinoamericanos.uchile.cl/handle/2250/8979301

Autor

MORIMOTO, N.I.

SWART, J.W.

RIELLA, H.G.

Institución

Instituto de Pesquisas Energéticas e Nucleares (Brasil)

Materias

titanium silicides

x-ray diffraction

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