Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor depositation

Artigo de peri??dico

Registro en:

1516-1439

http://repositorio.ipen.br/handle/123456789/6181

3

4

https://repositorioslatinoamericanos.uchile.cl/handle/2250/8977210

Autor

CARBONARI, M.J.

MARTINELLI, J.R.

Institución

Instituto de Pesquisas Energéticas e Nucleares (Brasil)

Materias

titanium nitrides

physical vapor deposition

stainless steel-304l

very high pressure

temperature range 0400-1000 k

surface properties

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