Plasmonic structures fabricated by interference lithography for sensor applications

dc.contributorUniversidade Estadual Paulista (UNESP)
dc.creatorMenezes, Jacson W.
dc.creatorNalin, Marcelo
dc.creatorChillcce, Enver F.
dc.creatorBraga, Edmundo S.
dc.creatorCescato, Lucila
dc.date2014-05-27T11:24:02Z
dc.date2016-10-25T18:27:38Z
dc.date2014-05-27T11:24:02Z
dc.date2016-10-25T18:27:38Z
dc.date2009-11-18
dc.date.accessioned2017-04-06T01:37:55Z
dc.date.available2017-04-06T01:37:55Z
dc.identifierProceedings of SPIE - The International Society for Optical Engineering, v. 7394.
dc.identifier0277-786X
dc.identifierhttp://hdl.handle.net/11449/71240
dc.identifierhttp://acervodigital.unesp.br/handle/11449/71240
dc.identifier10.1117/12.826129
dc.identifier2-s2.0-70449375195
dc.identifierhttp://dx.doi.org/10.1117/12.826129
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/892246
dc.descriptionIn this work we demonstrate the use of holographic lithography for generation of large area plasmonic periodic structures. Submicrometric array of holes, with different periods and thickness, were recorded in gold films, in areas of about 1 cm2, with homogeneity similar to that of samples recorded by Focused Ion Beam. In order to check the plasmonic properties, we measured the transmission spectra of the samples. The spectra exhibit the typical surface plasmon resonances (SPR) in the infrared whose position and width present the expected behavior with the period of the array and film thickness. The shift of the peak position with the permittivity of the surrounding medium demonstrates the feasebility of the sample as large area sensors. © 2009 SPIE.
dc.languageeng
dc.relationProceedings of SPIE - The International Society for Optical Engineering
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectHolography
dc.subjectMicrofabrication
dc.subjectPlasmonic structures
dc.subjectSurface plasmon resonance
dc.subjectGold film
dc.subjectHolographic lithography
dc.subjectInterference lithography
dc.subjectLarge area sensors
dc.subjectPeak position
dc.subjectPlasmonic properties
dc.subjectSensor applications
dc.subjectTransmission spectrums
dc.subjectHolographic interferometry
dc.subjectInfrared spectroscopy
dc.subjectLithography
dc.subjectMicroanalysis
dc.subjectMicromachining
dc.subjectNanostructures
dc.subjectOptical properties
dc.subjectSensors
dc.subjectPlasmons
dc.titlePlasmonic structures fabricated by interference lithography for sensor applications
dc.typeOtro


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