The deposition and control of self assembled silicon nano islands on crystalline silicon

dc.creatorZHENRUI YU
dc.creatorMARIANO ACEVES MIJARES
dc.date2008
dc.date.accessioned2023-07-25T16:23:14Z
dc.date.available2023-07-25T16:23:14Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1223
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7806420
dc.descriptionThe formation of nano sized Si structures during the annealing of silicon rich oxide (SRO) films was investigated. These films were synthesized by low pressure chemical vapor deposition (LPCVD) and used as precursors, a post-deposition thermal annealing leads to the formation of Si nano crystals in the SiO2 matrix and Si nano islands (Si nI) at c-Si/SRO interface. The influences of the excess Si concentration, the incorporation of N in the SRO precursors, and the presence of a Si concentration gradient on the Si nI formation were studied. Additionally the influence of pre-deposition substrate surface treatments on the island formation was investigated. Therefore, the substrate surface was mechanical scratched, producing high density of net-like scratches on the surface. Scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM) were used to characterize the synthesized nano islands. Results show that above mentioned parameters have significant influences on the Si nIs. High density nanosized Si islands can epitaxially grow from the c-Si substrate. The reported method is very simple and completely compatible with Si integrated circuit technology.
dc.formatapplication/pdf
dc.languageeng
dc.publisherWorld Scientific Publishing Company
dc.relationcitation:Kiebach, R. , et al., (2008). The deposition and control of self assembled silicon nano islands on crystalline silicon, International Journal of High Speed Electronics and Systems Vol. 18, (4 ): 901–910
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Si nano islands/Si nano islands
dc.subjectinfo:eu-repo/classification/Self assembly/Self assembly
dc.subjectinfo:eu-repo/classification/Epitaxial growth/Epitaxial growth
dc.subjectinfo:eu-repo/classification/Silicon-rich oxide/Silicon-rich oxide
dc.subjectinfo:eu-repo/classification/Photoluminescence/Photoluminescence
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleThe deposition and control of self assembled silicon nano islands on crystalline silicon
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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