Tesis
Deposição e caracterização de filmes ultrafinos de óxido de titânio depositados por Sputtering RF
Fecha
2012-03-30Registro en:
ALBUQUERQUE, Diego Aparecido Carvalho. Deposição e caracterização de filmes ultrafinos de óxido de titânio depositados por Sputtering RF. 2012. 108 f. Dissertação (Mestrado em Materiais Funcionais e Polímeros de Fontes Renováveis) - Universidade Federal de São Carlos, Sorocaba, 2012.
Autor
Albuquerque, Diego Aparecido Carvalho
Institución
Resumen
This work studied ultrathin films of titanium oxide deposited by the technique r. f. reactive sputtering with different oxygen flows and different deposition times. Optical properties were studied (ultra-violeta/Visível) and the surface morphology (Atomic Force Microscopy). The composition and structural properties of the films were analyzed by X-ray diffraction and Rutherford Backscattering Spectroscopy. The films are amorphous and rough (fractal dimension around 2.6 to 2.7 and roughness around 1.6 to 2.5 nm). The stoichiometry was fairly close to the titanium dioxide (TiO2). The optical energy Gap obtained by three different models presented values between 3.0 to 3.5 eV.