Thin film deposition with time-varying temperature

Artigo de Peri??dico

Fecha

2013

Registro en:

1742-5468

http://repositorio.ufba.br/ri/handle/ri/15019

http://repositorioslatinoamericanos.uchile.cl/handle/2250/2709710

Autor

Assis, Thiago Albuquerque de

Reis, F. D. A. Aar??o

Institución

Universidade Federal da Bahia (Brasil)

Resumen

Materias

Chemical vapor deposition (theory)

Kinetic roughening (theory)

Surface di usion (theory)

Thin lm deposition (theory)

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