Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

Artículos de revistas

Fecha

2006-08-01

Registro en:

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 249, p. 162-166, 2006.

0168-583X

http://hdl.handle.net/11449/36217

10.1016/j.nimb.2006.03.105

WOS:000239545000042

0000-0002-4511-3768

Autor

Universidade Estadual de Campinas (UNICAMP)

Universidade Estadual Paulista (Unesp)

Institución

Universidade Estadual Paulista (Brasil)

Resumen

This work illustrates the advantages of using p-polarized radiation at an incidence angle of 70 degrees in contrast to the conventional unpolarized beam at normal (or near-normal) incidence for the infrared spectroscopic study of polycarbosilane, polysilazane and polysiloxane thin films synthesized by plasma enhanced chemical vapor deposition (PECVD) and subsequently irradiated with 170 keV He+ ions at fluences from 1 x 10(14) to 1 x 10(16) cm(-2). Several bands not seen using the conventional mode could be observed in the polarized mode. (c) 2006 Elsevier B.V. All rights reserved.

Materias

ion irradiation

Si-based polymer film

plasma polymerization

chemical structure

FTIR

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