An electrochemical deposition route for obtaining alpha-fe2o3 thin films - ii. Eqcm study and semiconductor properties

dc.date.accessioned2017-03-23T17:49:17Z
dc.date.available2017-03-23T17:49:17Z
dc.date.created2017-03-23T17:49:17Z
dc.date.issued2007
dc.identifier1099-0062
dc.identifierhttp://hdl.handle.net/10533/178395
dc.identifier1040658
dc.identifierWOS:000248659800011
dc.languageeng
dc.publisherTHE SOCIETY
dc.relationhttps://doi.org/10.1149/1.2756160
dc.relation10.1149/1.2756160
dc.relationinfo:eu-repo/grantAgreement/Fondecyt/1040658
dc.relationinfo:eu-repo/semantics/dataset/hdl.handle.net/10533/93477
dc.relationinstname: Conicyt
dc.relationreponame: Repositorio Digital RI2.0
dc.relationinstname: Conicyt
dc.relationreponame: Repositorio Digital RI2.0
dc.rightsinfo:eu-repo/semantics/openAccess
dc.titleAn electrochemical deposition route for obtaining alpha-fe2o3 thin films - ii. Eqcm study and semiconductor properties
dc.typeArticulo


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