Thin film deposition from plasmas of tetramethylsilane-helium-argon mixtures with oxygen and with nitrogen

dc.creatorDa Cruz, NC
dc.creatorDurrant, SF
dc.creatorDe Moraes, MAB
dc.date1998
dc.dateAUG
dc.date2014-12-02T16:31:07Z
dc.date2015-11-26T17:41:31Z
dc.date2014-12-02T16:31:07Z
dc.date2015-11-26T17:41:31Z
dc.date.accessioned2018-03-29T00:23:19Z
dc.date.available2018-03-29T00:23:19Z
dc.identifierJournal Of Polymer Science Part B-polymer Physics. John Wiley & Sons Inc, v. 36, n. 11, n. 1873, n. 1879, 1998.
dc.identifier0887-6266
dc.identifierWOS:000074604600008
dc.identifier10.1002/(SICI)1099-0488(199808)36:11<1873
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/58190
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/58190
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/58190
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1287033
dc.descriptionFilms were produced by plasma enhanced chemical vapor deposition (PECVD) of tetramethylsilane (TMS) -helium-argon mixtures with either oxygen or nitrogen in a vacuum system fed with radiofrequency power. Actinometric optical emission spectroscopy was used to determine trends in the concentrations of plasma species of interest (H, CH, O, CO, and CN) as a function of the ratio of the inorganic reactive gas (oxygen or nitrogen) to the monomer (TMS) in the system feed. As the ratio of oxygen to TMS in the feed is increased, the degree of oxygenation of the deposited material, as revealed by transmission infrared spectroscopy, is also increased. Similarly, the degree of nitrogenation of the films increases with increasing nitrogen to monomer ratio in the feed. Strong correlations exist between the plasma concentrations of the above-mentioned plasma species and film structure and composition. (C) 1998 John Wiley & Sons, Inc.
dc.description36
dc.description11
dc.description1873
dc.description1879
dc.languageen
dc.publisherJohn Wiley & Sons Inc
dc.publisherNew York
dc.publisherEUA
dc.relationJournal Of Polymer Science Part B-polymer Physics
dc.relationJ. Polym. Sci. Pt. B-Polym. Phys.
dc.rightsfechado
dc.rightshttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dc.sourceWeb of Science
dc.subjectplasma-enhanced chemical vapor deposition
dc.subjectactinometric optical emission spectroscopy
dc.subjecttetramethylsilane
dc.subjectnitrogen
dc.subjectoxygen
dc.subjectGlow-discharge Polymerization
dc.subjectRadiofrequency Discharges
dc.subjectOptical-properties
dc.subjectGas-permeability
dc.subjectRf Discharges
dc.subjectMechanisms
dc.subjectHexamethyldisilazane
dc.subjectPolymers
dc.subjectSpectroscopy
dc.subjectMembranes
dc.titleThin film deposition from plasmas of tetramethylsilane-helium-argon mixtures with oxygen and with nitrogen
dc.typeArtículos de revistas


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