Artículos de revistas
Optical emission end point detecting for monitoring oxygen plasma a-C : H stripping
Registro en:
Vacuum. Pergamon-elsevier Science Ltd, v. 49, n. 3, n. 213, n. 215, 1998.
0042-207X
WOS:000072918100012
10.1016/S0042-207X(97)00139-5
Autor
Alves, MAR
Braga, ED
Fissore, A
Cescato, L
Institución
Resumen
The stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of O reactive species (777.2 nm) and CO emission (483.5 nm) intensity of the etching product. (C) 1998 Elsevier Science Ltd. All rights reserved. 49 3 213 215