Artículos de revistas
Modification Of Electrode Materials For Plasma Torches
Registro en:
Surface And Coatings Technology. , v. 200, n. 1-4 SPEC. ISS., p. 254 - 257, 2005.
2578972
10.1016/j.surfcoat.2005.02.015
2-s2.0-24644495675
Autor
Jankov I.R.
Szente R.N.
Goldman I.D.
Carreno M.N.P.
Valle M.A.
Behar M.
Costa C.A.R.
Galembeck F.
Landers R.
Institución
Resumen
As part of the studies of new materials to be used as electrodes for plasma torches, polycrystalline copper thin film substrates, obtained by depositing copper on silicon wafer using the Electron Beam technique, were implanted with low energy (20-50 keV) alkali ions. The samples, before and after implantation process, were analysed in terms of surface composition and work function changes. Although the implantation doses were low (3×1015 ions/cm2), relatively high concentrations of alkali metals were detected on the surface, which yielded a work function decrease of 3-9% in relation to the copper value. © 2005 Elsevier B.V. All rights reserved. 200 1-4 SPEC. ISS. 254 257 Szente, R.N., Munz, R.J., Drouet, M.G., (1990) J. Phys. D: Appl. Phys., 25, p. 1193 Szente, R.N., Munz, R.J., Drouet, M.G., (1992) Plasma Chem. Plasma Process., 12 (6), p. 327 Szente, R.N., Munz, R.J., Drouet, M.G., (1992) Pure Appl. Chem., 64 (5), p. 657 Szente, R.N., Munz, R.J., Drouet, M.G., (1994) J. Phys. D: Appl. Phys., 27, p. 1443 Jankov, I.R., Szente, R.N., Goldman, I.D., Carreño, M.N.P., Swart, J.W., Landers, R., (2001) Br. J. Phys., 31 (4), p. 552 Jankov, I.R., Szente, R.N., Goldman, I.D., (2002) Vacuum, 65, p. 547 Ziegler, J.F., Biersack, J.P., Littmark, U., (1985) The Stopping and Range of Ions in Solids, , New York: Pergamon Press Nonnenmacher, M., O'Boyle, M.P., Wickramasinghe, H.K., (1991) Appl. Phys. Lett., 58 (25), p. 2921 Martin, Y., Williams, C.C., Wickramasinghe, H.K., (1987) J. Appl. Phys., 61 (10), p. 4723 (1997) CRC Handbook, , 78th ed