Artículos de revistas
Hard A-c:h Films Deposited At High Deposition Rates
Registro en:
Thin Solid Films. , v. 343-344, n. 1-2, p. 222 - 225, 1999.
406090
2-s2.0-0032650292
Autor
Marques F.C.
Lacerda R.G.
De Lima Jr. M.M.
Vilcarromero J.
Institución
Resumen
In this work, we present hard-hydrogenated amorphous carbon films at high deposition rate. The films were prepared on the cathode electrode of a conventional r.f. sputtering system. Hydrogenated amorphous carbon films with excellent properties, i.e, high hardness (15 GPa), relatively low stress (∼1.3 GPa) and with a very high deposition rate (∼0.7 nm/s) were obtained at the conditions of high bias (-800 V) and high methane gas pressure (0.12 × 10-1 mbar). The low band gap and the high ID/IG Raman ratio indicate that the films have high amount of sp2 sites. © 1999 Elsevier Science S.A. All rights reserved. 343-344 1-2 222 225 Robertson, J., (1991) Prog. Solid St. Chem, 21, p. 199 Neuville, S., Matthews, A., (1997) MRS Bulletin, 22, p. 22 Lacerda, R.G., Marques, F.C., (1998) Appl. Phys. Lett., 73 (5), p. 617 Marques, F.C., Lacerda, R.G., Odo, G.Y., Lepienski, C.M., (1998) Thin Solid Films, 332, p. 113 Campbell, D.S., Mechanical Properties of Thin Films Cap. 12th (1970) Handbook of Thin Film Technology, , L.I. Maissel, R. Glang (Eds.), McGraw-Hill, New York Franceschini, D.F., Achete, C.A., Freire Jr., F.L., (1992) Appl. Phys. Lett., 60, p. 3229 Yamamoto, K., Ichikawa, Y., Nakayawa, T., Tawada, Y., (1988) Jpn. J. Appl. Phys., 27, p. 1415 Jiang, X., Reichelt, K., Stritzker, B., (1989) J. Appl. Phys., 66 (12), p. 5805 Zou, J.W., Reichelt, K., Schmidt, K., Dischler, B., (1989) J. Appl. Phys., 65 (10), p. 3915 Catherine, Y., Couderc, P., (1986) Thin Solid Films, 144, p. 265 Jiang, X., Reichelt, K., Stritzker, B., (1989) J. Appl. Phys., 66, p. 1018 Schwan, J., Ulrich, S., Jung, K., Ehrhardt, H., Samlenski, R., Brenn, R., (1995) Diamond Related Mater., 4, p. 304 Robertson, J., (1996) J. Non-Cryst. Solids, 198, p. 614 Robertson, J., (1997) Diamond Related Mater., 6, p. 212 Fallon, P.J., Veerasamy, V.S., Davis, C.A., Robertson, J., Amaratunga, G.A.J., Milne, W.I., Koskinen, J., (1993) Phys. Rev. B, 48, p. 4777 Schwan, J., Ulrich, S., Batori, V., Ehrhardt, H., Silva, S.R.P., (1996) J. Appl. Phys., 80, p. 440 Tamor, M., Vassel, W., (1994) J. Appl. Phys., 76, p. 446 Prawer, S., Nugeat, K.W., Lifshitz, Y., Lampert, G.D., Grossman, E., Kulik, J., Kalish, R., (1996) Diamond Related Mater., 5, p. 433