Artículos de revistas
Measurement Of Optical Constants Of Thin A-c:h Films
Registro en:
Microelectronics Journal. Elsevier Science Ltd, Exeter, United Kingdom, v. 31, n. 4, p. 251 - 254, 2000.
262692
10.1016/S0026-2692(99)00111-1
2-s2.0-0033903523
Autor
De Souza D.R.
Soares L.L.
Cescato L.
Alves M.A.R.
Braga E.S.
Institución
Resumen
Amorphous hydrogenated carbon films (a-C:H) are very interesting materials for optical applications. They are transparent in the near IR part of the spectrum and its refractive index and absorption coefficient may be changed with the deposition parameters. In this paper we measure the optical constants of a-C:H films, deposited by plasma enhanced chemical vapor deposition as a function of the radio frequency power. The measurements were performed by the method of Abeles in λ = 633 nm and by the approximation of Lambert-Beer in the transmission measurements using a spectrophotometer. Both methods do not require the use of thick films that are difficult to deposit due to the intrinsic stress of these films. The measurements were compared with that obtained by the fringe peaks in transmission measurements of a thick film. Our results showed that it is possible, in our system, to deposit homogeneous and uniform films with any refractive index chosen between 1.8 and 2.2 at λ = 633 nm. 31 4 251 254 Holland, L., Ojha, S.M., The growth of carbon films with random atomic structure from ion impact damage in a hydrocarbon plasma (1976) Thin Solid Films, 58, pp. 107-116 Angus, J.C., Koidl, P., Domitz, S., (1986) Plasma Deposited Thin Films, p. 89. , J. Mort, & F. Jansen. Boca Raton: CRC Press Kakuchi, M., Hikita, M., Tamamura, T., Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithography (1986) Appl. Phys. Lett., 48, pp. 835-837 Kragler, K., Günther, E., Leuschner, R., Falk, G., Hammerschimidt, A., Von Seggern, H., Saemann-Ischenko, G., Scanning-tunneling-microscopy based lithography employing amorphous hydrogenated carbon as a high-resolution resist mask (1995) Appl. Phys. Lett., 67, pp. 1163-1165 Martino, R., Ferguson, R., Molless, A., Liebmann, L., Neisser, M., Weed, J., Callegari, S., Lithographic evaluation of the hydrogenated amorphous carbon film (1995) J. Vac. Sci. Technol. B, 13 (6), pp. 2949-2953 Lima, C.R.A., Soares, L.L., Cescato, L., Alves, M.A.R., Braga, E.S., Diffractive structures holographically recorded in amorphous hydrogenated carbon (a-C:H) films (1997) Opt. Lett., 2223, pp. 1805-1807 Françon, M., (1961) Progress in Microscopy, , New York: Row, Patterson & Elmsford. Chap. 6 Born, M., Wolf, E., (1975) Principles of Optics, , Oxford: Pergamon Press. chap. 13 Freeman, E., Paul, W., Optical constants of r.f. sputtered hydrogenated amorphous Si (1979) Phys. Rev. B, 20, pp. 716-728