Artículos de revistas
Mechanisms Of Polymer Film Deposition From R.f. Discharges Of Acetylene, Nitrogen And Helium Mixtures
Registro en:
Thin Solid Films. , v. 259, n. 2, p. 139 - 145, 1995.
406090
10.1016/0040-6090(94)06439-3
2-s2.0-0029291054
Autor
Durrant S.F.
Marcal N.
Castro S.G.
Vinhas R.C.G.
De Moraes M.A.B.
Nicola J.H.
Institución
Resumen
Mixtures of C2H2, He and N2 were polymerized in an r.f. discharge. Quantitative optical emission spectroscopy was used to determine relative concentrations of the key species CH and CN in the plasma as a function of the proportions of monomer gases in the feed, and to delineate the behavior of the electron mean energy and number density in the discharge. Transmission IR spectroscopy (IRS) and electron spectroscopy for chemical analysis (ESCA) of films deposited from discharges containing different proportions of nitrogen revealed the incorporation of both CH and CN in the deposited material. Deposition rates were also determined and their connection with deposition mechanisms via gas-phase and surface reactions is outlined. © 1995. 259 2 139 145 Yasuda, (1985) Plasma Polymerization, , Academic Press, New York Morita, Hattori, (1990) Plasma Deposition Treatment and Etching of Polymers, p. 423. , R. d'Agostino, Academic Press, New York, Chapter 6 Inagaki, Yagi, Katsuura, (1982) Eur. Polym. J., 18, p. 621 Gerstenberg, Bayer, (1987) J. Appl. Phys., 62, p. 1782 Wang, Chen, (1991) J. Appl. Polym. Sci., 42, p. 233 Yasuda, Hirotsu, (1978) J. Polym. Sci. Polym. Chem. Ed., 16, p. 229 Yasuda, Hirotsu, (1977) J. Polym. Sci. Polym. Chem. Ed., 15, p. 2749 Morinaka, Asano, (1982) J. Appl. Polym. Sci., 27, p. 2139 Coburn, Chen, (1980) J. Appl. Phys., 51, p. 3134 Durrant, Mota, de Moraes, (1992) Thin Solid Films, 220, p. 295 Scofield, (1976) J. Eleetron. Spectrosc. Relat. Phenom., 8, p. 129 Durrant, Mota, de Moraes, (1992) J. Appl. Phys., 71, p. 448 d'Agostino, Martinu, Pische, (1991) Plasma Chem. Plasma Process, 11, p. 1 Yasuda, Marsh, Bumgarner, Morosoff, Polymerization of organic compounds in an electrodeless glow discharge. VI. Acetylene with unusual comonomers (1975) Journal of Applied Polymer Science, 19, p. 2845 Behnisch, Hollander, Zimmermann, Surface modification of polyethylene by remote dc discharge plasma treatment (1993) Journal of Applied Polymer Science, 49, p. 117 Pitt, Lakenan, Strong, (1993) J. Appl. Polym. Sci., 48, p. 845 Hudis, (1974) Techniques and Applications of Plasma Chemistry, , J.R. Hollahan, A.T. Bell, Wiley, New York, Chapter 3 Kieser, Neusch, (1984) Thin Solid Films, 118, p. 203 Yasuda, Bumgarner, Marsh, Morosoff, Plasma polymerization of some organic compounds and properties of the polymers (1916) Journal of Polymer Science: Polymer Chemistry Edition, 14, p. 195 Yasuda, (1985) Plasma Polymerization, pp. 115-131. , Academic Press, New York Bhatia, Burrell, Chera, XPS surface studies of injection-molded poly(phenylene ether)/nylon 6,6 and poly(phenylene ether)/HIPS blends (1992) Journal of Applied Polymer Science, 46, p. 1915 Durrant, Castro, Mota, China, Shiosawa, Lambert, de Moraes, (1991) Proc. Brazilian Polymer Conf., pp. 510-513. , São Paulo, SP, 5–7 November 1991, Associaçāo Brasiliera de Polimeros, São Paulo d'Agostino, Cramarossa, Caloprico, d'Ettole, (1983) J. Appl. Phys., 54, p. 1284 d'Agostino, Cramarossa, Fracassi, Desmoni, Sabbatini, Zambonin, Caporiccio, (1986) Thin Solid Films, 143, p. 163 d'Agostino, Cramarossa, Illuzzi, (1987) J. Appl. Phys., 61, p. 2754