Artículos de revistas
Metallic Submicrometer Sieves Fabricated By Interferometric Lithography And Electroforming
Registro en:
Journal Of Micromechanics And Microengineering. , v. 15, n. 10, p. 1932 - 1937, 2005.
9601317
10.1088/0960-1317/15/10/020
2-s2.0-24644466764
Autor
Gutierrez-Rivera L.E.
De Carvalho E.J.
Silva M.A.
Cescato L.
Institución
Resumen
We propose and demonstrate a low cost technique to fabricate submicrometer sieves using the association of laser interference lithography and nickel electroforming. The sieves are fabricated on glass substrates and are released from the substrate by adding a hexagonal sustaining structure, electroformed in nickel, using conventional lithography. The resulting sieves are free self-sustained membranes similar to those used in filtration devices, with typical diameters of the holes of about 250 nm and areas of about 1 cm 2. © 2005 IOP Publishing Ltd. 15 10 1932 1937 Schuster-Woldan, H., Weingand, K., Koch, D., (1977) Process for Producing A Thin Metal Structure with A Self-supporting Frame Deutsch, M., Landau, T., Gordon, R.E., (1988) Manufacture of Microsieves and the Resulting Microsieves Kuiper, S., Van Wolferen, H., Van Rijn, C., Nijdam, W., Krijnem, G., Elwenspoek, M., Fabrication of microsieves with sub-micron pore size by laser interference lithography (2001) J. Micromech. Microeng., 11 (1), pp. 33-37 Van Rijn, C.J.M., Veldhuis, G.J., Kuiper, S., Nanosieves with microsystem technology for microfiltration applications (1998) Nanotechnology, 9 (4), pp. 343-345 Kuiper, S., De Boer, M., Van Rijn, C., Nijdam, W., Krijnen, G., Elwenspoek, M., Wet and dry etching techniques for the release of sub-micrometre perforated membranes (2000) J. Micromech. Microeng., 10 (2), pp. 171-174 www.microchemicals.deCescato, L., Frejlich, J., Mendes, J.F., Analysis of an active stabilization system for an holographic setup (1988) Appl. Opt., 27 (10), pp. 1967-1976 Zaidi, H.S., Brueck, S.R.J., Multiple-exposure interferometric lithography (1993) J. Vac. Sci. Technol., 11 (3), pp. 658-666 Fernandez, A., Decker, J.Y., Herman, S.M., Phillion, D.W., Sweeney, D.W., Perry, M.D., Methods for fabricating arrays of holes using interference lithography (1997) J. Vac. Sci. Technol., 15 (6), pp. 2439-2443 Mack, C.A., Development of positive photoresists (1987) J. Electrochem. Soc., 134 (1), pp. 148-152 Mello, B.A., Costa, I.F., Lima, C.R.A., Cescato, L., Developed profile of holographically exposed photoresist gratings (1995) Appl. Opt., 34, pp. 597-603 Zaidi, S.H., Brueck, S.R.J., High aspect-ratio holographic photoresist gratings (1988) Appl. Opt., 27 (14), pp. 2999-3002 Spiro, P., (1971) Electroforming: A Comprehensive Survey of Theory, Practice and Commercial Applications Griffiths, S.K., Nilson, R.H., Hruby, J.M., (1997) Modeling Electrodeposition for LIGA Microdevice Fabrication Van Rijn, C.J.M., Van Der Wekken, M., Nijdam, W., Elwenspoek, M.C., Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining (1997) J. Microelectromech. Syst., 6 (1), pp. 48-54 Kuiper, S., (2000) PhD Dissertation Kuiper, S., Van Rijn, C.J., Nijdam, W., Elwenspoek, M.C., Development and applications of very high flux microfiltration membranes (1998) J. Membrane Sci., 150 (1), pp. 1-8