Now showing items 1-10 of 256
ACTIVATION OF HMDSO THIN FILMS WITH LOW PRESSURE ARGON PLASMA AND VACUUM ULTRAVIOLET RADIATION
(Plapiqui(uns-conicet)Bahia BlancaArgentina, 2012)
Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma
(Pergamon-elsevier Science LtdOxfordInglaterra, 2004)
Modified branching ratio method for absolute intensity calibration in VUV spectroscopy
(Ieee-inst Electrical Electronics Engineers IncPiscatawayEUA, 2005)
A Novel Plasma Technique for Surface Treatment: The Plasma Expander
(Institute of Electrical and Electronics Engineers (IEEE), 2012-02-01)
This paper describes a new plasma treatment method: the plasma expander. In this approach, expanding shock waves are generated in a vacuum chamber by pulsed plasmas. Collisions of fast species in the waves modify the ...
REPRODUCIBILITY OF A TITANIUM PLASMA VACUUM SPARK DISCHARGE
(IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2005)
Should we measure serum or plasma lead concentrations?
(ELSEVIER GMBH, URBAN & FISCHER VERLAG, 2010)
Project: Serum samples may not be appropriate to assess lead (Pb) concentrations because they may contain artificially higher Pb concentrations compared with those measured in plasma samples. Here, we compared Pb concentrations ...
MHD Equilibrium with Reversed Current Density and Magnetic Islands Revisited: the Vacuum Vector Potential Calculus
(Iop Publishing LtdBristolInglaterra, 2013)