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Nanocrystalline carbon flakes deposited by RF magnetron sputtering

Guzmán Olivos, Fernando; Espinoza González, Rodrigo; Fuenzalida Escobar, Víctor (Elsevier, 2016)

Carbon nanostructures were prepared by RF magnetron sputtering at deposition times from 30 to 120 min and temperatures on silicon substrates from 390 degrees C to 510 degrees C. Scanning and transmission electron microscopy ...

Characterization of thin carbon films produced by the magnetron sputtering technique

Nuclear and Energy Research Institute; FATEC-SP; Universidade de São Paulo (USP); Universidade Estadual Paulista (Unesp) (2016-05-01)

Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) ...

Production and characterization of carbon thin films by the magnetron sputtering technique

SILVA, D.L.C.; KASSAB, L.R.P.; MARTINELLI, J.R.; SANTOS, A.D.; PILLIS, M.F. (2017)

Characterization of thin carbon films produced by the magnetron sputtering technique

COSTA E SILVA, DANILO L.; KASSAB, LUCIANA R.P.; MARTINELLI, JOSE R.; SANTOS, ANTONIO D. dos; RIBEIRO, SIDNEY J.L.; SANTOS, MOLIRIA V. dos (2016)

Electro-optically sensitive diamond-like carbon thin films deposited by reactive magnetron sputtering for electronic device applications

Rizzo, Vinícius Zacarias; Mansano, Ronaldo Domingues (ELSEVIER SCIENCE SA, 2011)

The goal of this work is to study and relate electrical and optical properties of diamond-like carbon (DLC) thin films for applications in electronic devices. DLC films were deposited in a reactive RF magnetron sputtering ...

Evaluation of carbon thin films using raman spectroscopy

SILVA, DANILO L.C. e; KASSAB, LUCIANA R.P.; SANTOS, ANTONIO D. dos; PILLIS, MARINA F. (2018)

Microscopic behavior of carbon stripper foils prepared by a mixed ion beam sputtering method under heavy ion beam bombardmentMicroscopic behavior of carbon stripper foils prepared by a mixed ion beam sputtering method under heavy ion beam bombardment

López Monroy, J.; Muto, Hideshi (Revista Mexicana de Física, 2009)

Filmes finos de carbono depositados por meio da t??cnica de magnetron sputtering usando cobalto, cobre e n??quel como buffer-layersCarbon thin films deposited by the magnetron sputtering technique using cobalt, copper and nickel as buffer-layers

COSTA e SILVA, DANILO L. (2015)

Produ????o e caracteriza????o de filmes finos de carbono pela t??cnica de Magnetron Sputtering

SILVA, D.L.C.; KASSAB, L.R.P.; MARTINELLI, J.R.; SANTOS, A.D.; RIBEIRO, S.J.L.; PILLIS, M.F.; CONGRESSO BRASILEIRO DE CERAMICA, 59. (2016)

Nanocrystalline carbon flakes deposited by RF magnetron sputtering

Unknown author (2016)

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Nanocrystalline carbon flakes deposited by RF magnetron sputtering

Characterization of thin carbon films produced by the magnetron sputtering technique

Production and characterization of carbon thin films by the magnetron sputtering technique

Characterization of thin carbon films produced by the magnetron sputtering technique

Electro-optically sensitive diamond-like carbon thin films deposited by reactive magnetron sputtering for electronic device applications

Evaluation of carbon thin films using raman spectroscopy

Microscopic behavior of carbon stripper foils prepared by a mixed ion beam sputtering method under heavy ion beam bombardmentMicroscopic behavior of carbon stripper foils prepared by a mixed ion beam sputtering method under heavy ion beam bombardment

Filmes finos de carbono depositados por meio da t??cnica de magnetron sputtering usando cobalto, cobre e n??quel como buffer-layersCarbon thin films deposited by the magnetron sputtering technique using cobalt, copper and nickel as buffer-layers

Produ????o e caracteriza????o de filmes finos de carbono pela t??cnica de Magnetron Sputtering

Nanocrystalline carbon flakes deposited by RF magnetron sputtering