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Optimization of the contact resistance in the interface structure of n-type Al/a-SiC:H by thermal annealing for optoelectronics applications
(WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim, 2010)
MOHOS-type memory performance using HfO₂ nanoparticles as charge trapping layer and low temperature annealing
(Materials Science and Engineering B, 2012)
Optoelectronic properties of tin doped indium oxide films fabricated by DC magnetron sputtering with post annealing in oxygen atmosphere
(Instituto Nacional de Astrofísica, Óptica y Electrónica, 2014)
FTIR and photoluminescence of annealed silicon rich oxide films
(Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales, 2009)
Optoelectronic properties of tin doped indium oxide films fabricated by DC magnetron sputtering with post annealing in oxygen atmosphere
(Instituto Nacional de Astrofísica, Óptica y Electrónica, 2014)
Degradation and Breakdown of W–La2O3 Stack after Annealing in N2
(The Japan Society of Applied Physics, 2008)
Degradation and Breakdown of W–La2O3 Stack after Annealing in N2
(The Japan Society of Applied Physics, 2008)